설명
Lam AutoEtch 590, the most popular model for 4 to 6 inch wafer plasma etcher. The gap between top and bottom electrode is adjustable, which make the etcher more flexible with much better performance.환경 설정
Main Etcher Materials: SiO2 etc.OEM 모델 설명
The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 8일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138623
웨이퍼 사이즈:
4"/100mm, 6"/150mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH CORPORATION
AUTOETCH 590
카테고리
Dry / Plasma Etch
마지막 검증일: 8일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138623
웨이퍼 사이즈:
4"/100mm, 6"/150mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Lam AutoEtch 590, the most popular model for 4 to 6 inch wafer plasma etcher. The gap between top and bottom electrode is adjustable, which make the etcher more flexible with much better performance.환경 설정
Main Etcher Materials: SiO2 etc.OEM 모델 설명
The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.문서
문서 없음