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LAM RESEARCH CORPORATION RAINBOW 4420
    설명
    Plasma Etch
    환경 설정
    Install Type: Thru-the-wall (TTW) Status Lamp System software (App): Envision ver1.5.1 SECS I Interface Cassette Interface: (2) Hine 38F indexers Electrostatic Chuck (ESC) Endpoint Detection: Monochromator 405nm / 520nm Turbo: Seiko Seiki STP H200C RF Match Type: LAM On-board RF Generators: No RF Generator: ENI OEM-650A RF Hours: 402056 Remote RF Cart: No ATM Passivation Module: No Plasma LLK (PLL): No High Conductance Manifold: No Gas Box: Remote gas Box: No Orbitally welded GB: Yes Backside cooling MFC: Unit 1250A Gases: #1: N2, 200 sccm, Unit 1200A #2: CHF3, 50 sccm, Unit 1200A #3: N2, 300 sccm, Aera #4: N2, 500 sccm, Unit UFC 1660 #5: CF4, 150 sccm, Unit 1200A #6: SF6, 150 sccm, Unit 1200A #7: He, 1 slm, Unit UFC 1660 #8: O2, 200 sccm, Unit UFC 1660 Pump: Heated pumping manifolds: No Pump controller: iQ Series Entrance / Exit: Edwards iQDP-40 Main: Edwards iQDP-80 Chiller(s): (2) SMC HRS018-WN-20-M On-board AC Distribution type: Fused Power requirements: 208VAC, 3-Phase, 5-Wire
    OEM 모델 설명
    The LRC Rainbow Etchers are fully automated, in-line, single-wafer plasma/RIE etching systems that processes 6-inch, or 8-inch wafers and features top or/and bottom powered electrode plate, programmable electrode spacing, and automatic noncontact wafer alignment and placement. Unique RF match networks are located at the upper and lower electrodes for programmable switching between plasma and RIE modes. Designed for continuous operation, the LRC Rainbow etchers are computer-controlled, allowing either manual or automatic control. The Lam Rainbow 44XX Series can be for Tungsten silicide, Silicon nitride, polysilicon ,oxide, Crystallise Si etc.
    문서

    문서 없음

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    verified-listing-icon

    검증됨

    카테고리
    Dry / Plasma Etch

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    63314


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    1993


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION RAINBOW 4420

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    Dry / Plasma Etch
    빈티지: 0조건: 개조됨
    마지막 검증일60일 이상 전

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    verified-listing-icon
    검증됨
    카테고리
    Dry / Plasma Etch
    마지막 검증일: 60일 이상 전
    listing-photo-5111deec793545edb0e504079a78b326-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/43570/5111deec793545edb0e504079a78b326/8af0de4a0b6a44f0b7d3e68908aa18d6_c32f11279e93444ebe59a56697a5ee981201a_mw.jpeg
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    63314


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    1993


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Plasma Etch
    환경 설정
    Install Type: Thru-the-wall (TTW) Status Lamp System software (App): Envision ver1.5.1 SECS I Interface Cassette Interface: (2) Hine 38F indexers Electrostatic Chuck (ESC) Endpoint Detection: Monochromator 405nm / 520nm Turbo: Seiko Seiki STP H200C RF Match Type: LAM On-board RF Generators: No RF Generator: ENI OEM-650A RF Hours: 402056 Remote RF Cart: No ATM Passivation Module: No Plasma LLK (PLL): No High Conductance Manifold: No Gas Box: Remote gas Box: No Orbitally welded GB: Yes Backside cooling MFC: Unit 1250A Gases: #1: N2, 200 sccm, Unit 1200A #2: CHF3, 50 sccm, Unit 1200A #3: N2, 300 sccm, Aera #4: N2, 500 sccm, Unit UFC 1660 #5: CF4, 150 sccm, Unit 1200A #6: SF6, 150 sccm, Unit 1200A #7: He, 1 slm, Unit UFC 1660 #8: O2, 200 sccm, Unit UFC 1660 Pump: Heated pumping manifolds: No Pump controller: iQ Series Entrance / Exit: Edwards iQDP-40 Main: Edwards iQDP-80 Chiller(s): (2) SMC HRS018-WN-20-M On-board AC Distribution type: Fused Power requirements: 208VAC, 3-Phase, 5-Wire
    OEM 모델 설명
    The LRC Rainbow Etchers are fully automated, in-line, single-wafer plasma/RIE etching systems that processes 6-inch, or 8-inch wafers and features top or/and bottom powered electrode plate, programmable electrode spacing, and automatic noncontact wafer alignment and placement. Unique RF match networks are located at the upper and lower electrodes for programmable switching between plasma and RIE modes. Designed for continuous operation, the LRC Rainbow etchers are computer-controlled, allowing either manual or automatic control. The Lam Rainbow 44XX Series can be for Tungsten silicide, Silicon nitride, polysilicon ,oxide, Crystallise Si etc.
    문서

    문서 없음

    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION RAINBOW 4420

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    Dry / Plasma Etch빈티지: 0조건: 개조됨마지막 검증일:60일 이상 전
    LAM RESEARCH CORPORATION RAINBOW 4420

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    Dry / Plasma Etch빈티지: 0조건: 중고마지막 검증일:60일 이상 전
    LAM RESEARCH CORPORATION RAINBOW 4420

    LAM RESEARCH CORPORATION

    RAINBOW 4420

    Dry / Plasma Etch빈티지: 0조건: 중고마지막 검증일:60일 이상 전