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LAM RESEARCH CORPORATION 2300 KIYO GX
    설명
    Poly Etcher
    환경 설정
    RF system, pressure control system and temperature control system, including the RF generator, Phase/Magnitude Sensor, Cap Motor driver, turbo pump (TMP), Pendulum (Throttle) valve, Hoist, Electrostatic Chuck (ESC), heater, and coolant path. SYSTEM INTERCONNECT: 224-800096-830 SUPPLY CIRCUIT VOLTAGE RATING: 208VAC +10%, -10% FREQUENCY: 50/60 Hz SUPPLY CIRCUIT RATING: 3 Ph, 3 WIRE + PROTECTIVE GND PM FULL-LOAD CURRENT: 25.8 AMP RF FULL-LOAD CURRENT: 68.00 AMP RATING OF LARGEST LOAD: 38 AMP MAIN CB CURRENT RATING: 80 AMP RF CB RATING: 80 AMP RF generator type: AE Navigator II
    OEM 모델 설명
    REACTIVE ION ETCH (RIE) Conductor etch helps shape the electrically “active” materials of a semiconductor device. Even a slight variation in these miniature structures can degrade device performance. In fact, these structures are so tiny and sensitive that etch processes push the boundaries of the basic laws of physics and chemistry. Lam’s Kiyo® product family delivers the high-performance capabilities needed to precisely and consistently form these features precisely and with high productivity. For some applications, select models are also available through our Reliant® Systems as refurbished products, providing lower cost of ownership with the same quality assurance and performance as new systems.
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    검증됨

    카테고리
    Dry / Plasma Etch

    마지막 검증일: 2일 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    148401


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2024


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION 2300 KIYO GX

    LAM RESEARCH CORPORATION

    2300 KIYO GX

    Dry / Plasma Etch
    빈티지: 2024조건: 중고
    마지막 검증일2일 전

    LAM RESEARCH CORPORATION

    2300 KIYO GX

    verified-listing-icon
    검증됨
    카테고리
    Dry / Plasma Etch
    마지막 검증일: 2일 전
    listing-photo-9bd2adf1e3294e2199b27721ad1acc5d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1289/9bd2adf1e3294e2199b27721ad1acc5d/a6d561743ebb432fb42d24b5797d781c_f93d377202a84d36b8fa4ebfe4477f891201a_mw.jpeg
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    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    148401


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2024


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Poly Etcher
    환경 설정
    RF system, pressure control system and temperature control system, including the RF generator, Phase/Magnitude Sensor, Cap Motor driver, turbo pump (TMP), Pendulum (Throttle) valve, Hoist, Electrostatic Chuck (ESC), heater, and coolant path. SYSTEM INTERCONNECT: 224-800096-830 SUPPLY CIRCUIT VOLTAGE RATING: 208VAC +10%, -10% FREQUENCY: 50/60 Hz SUPPLY CIRCUIT RATING: 3 Ph, 3 WIRE + PROTECTIVE GND PM FULL-LOAD CURRENT: 25.8 AMP RF FULL-LOAD CURRENT: 68.00 AMP RATING OF LARGEST LOAD: 38 AMP MAIN CB CURRENT RATING: 80 AMP RF CB RATING: 80 AMP RF generator type: AE Navigator II
    OEM 모델 설명
    REACTIVE ION ETCH (RIE) Conductor etch helps shape the electrically “active” materials of a semiconductor device. Even a slight variation in these miniature structures can degrade device performance. In fact, these structures are so tiny and sensitive that etch processes push the boundaries of the basic laws of physics and chemistry. Lam’s Kiyo® product family delivers the high-performance capabilities needed to precisely and consistently form these features precisely and with high productivity. For some applications, select models are also available through our Reliant® Systems as refurbished products, providing lower cost of ownership with the same quality assurance and performance as new systems.
    문서

    문서 없음

    유사 등재물
    모두 보기
    LAM RESEARCH CORPORATION 2300 KIYO GX

    LAM RESEARCH CORPORATION

    2300 KIYO GX

    Dry / Plasma Etch빈티지: 2024조건: 중고마지막 검증일:2일 전