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MATTSON paradigm SI
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    OEM 모델 설명
    Built on the paradigm product architecture, paradigm Si incorporates enhancements to enable customers to run the chemistries required for poly-silicon applications. The system features Mattson Technology's proprietary Faraday shield designed to improve etch process control and enhance mean-time-between-clean (MTBC) performance by up to three times over competitive systems. The paradigm Si also enables true independent control of ion density and energy, providing improved profile control and minimized sputtering to reduce maintenance costs for the lowest cost-of-ownership. The paradigm Si is specifically targeted at semi-critical poly etch applications by providing excellent process performance with over 30% better cost-of ownership advantages over any competitive etch system currently on the market.
    문서

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    MATTSON

    paradigm SI

    verified-listing-icon

    검증됨

    카테고리
    Dry / Plasma Etch

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    86540


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2012


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etch
    빈티지: 2011조건: 중고
    마지막 검증일60일 이상 전

    MATTSON

    paradigm SI

    verified-listing-icon
    검증됨
    카테고리
    Dry / Plasma Etch
    마지막 검증일: 60일 이상 전
    listing-photo-c61b91715fc74738bf9cf85a9e2795c7-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    86540


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2012


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    Built on the paradigm product architecture, paradigm Si incorporates enhancements to enable customers to run the chemistries required for poly-silicon applications. The system features Mattson Technology's proprietary Faraday shield designed to improve etch process control and enhance mean-time-between-clean (MTBC) performance by up to three times over competitive systems. The paradigm Si also enables true independent control of ion density and energy, providing improved profile control and minimized sputtering to reduce maintenance costs for the lowest cost-of-ownership. The paradigm Si is specifically targeted at semi-critical poly etch applications by providing excellent process performance with over 30% better cost-of ownership advantages over any competitive etch system currently on the market.
    문서

    문서 없음

    유사 등재물
    모두 보기
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etch빈티지: 2011조건: 중고마지막 검증일:60일 이상 전
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etch빈티지: 2012조건: 중고마지막 검증일:60일 이상 전
    MATTSON paradigm SI

    MATTSON

    paradigm SI

    Dry / Plasma Etch빈티지: 2011조건: 중고마지막 검증일:60일 이상 전