설명
OXFORD Plasmalab 100 RIE (FL) Reactive Ion Etcher환경 설정
Supports wafer sizes up to 300mm (330mm Platen) RIE set up for SiO2 Etch RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz, Chamber Turbo Pump : Alcatel ATH 400M w/ ACT 600M controller Blue color PLC type Water cooled electrode 10C-80C Gas pod with 6 lines including following MFCs: Ar – 100sccm N2 – 200sccm CHF3 – 200sccm NF3 – 200sccm N2O – 200sccm Windows PC , user friendly interface Lauda WK 1200 Chiller was utilized by previous user. Not included.OEM 모델 설명
미제공문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138679
웨이퍼 사이즈:
알 수 없음
빈티지:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
PLASMAPRO 100
카테고리
Dry / Plasma Etch
마지막 검증일: 7일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
138679
웨이퍼 사이즈:
알 수 없음
빈티지:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
OXFORD Plasmalab 100 RIE (FL) Reactive Ion Etcher환경 설정
Supports wafer sizes up to 300mm (330mm Platen) RIE set up for SiO2 Etch RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz, Chamber Turbo Pump : Alcatel ATH 400M w/ ACT 600M controller Blue color PLC type Water cooled electrode 10C-80C Gas pod with 6 lines including following MFCs: Ar – 100sccm N2 – 200sccm CHF3 – 200sccm NF3 – 200sccm N2O – 200sccm Windows PC , user friendly interface Lauda WK 1200 Chiller was utilized by previous user. Not included.OEM 모델 설명
미제공문서
문서 없음