설명
RIE Strip환경 설정
환경 설정 없음OEM 모델 설명
The Vision 320 RIE provides etch capability for R&D, prototyping, and low volume production. This parallel-plate capacitance based systems is found in applications that include fundamental material studies, surface modification, semiconductor device fabrication, and failure analysis involving delayering. This system, found in both academic and industrial environments, is a result of their small footprint along with robust construction that focuses on ease of use and low maintenance. The Vision systems satisfy the high reliability requirements for critical applications such as delayering where production is dependent on constant input from the Failure Analysis department. Being outside of the fabrication process, means that the system must have turnkey operation for non-etch process oriented engineers.문서
문서 없음
카테고리
Dry / Plasma Etch
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
140107
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PLASMATHERM
Vision 320
카테고리
Dry / Plasma Etch
마지막 검증일: 2일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
140107
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
RIE Strip환경 설정
환경 설정 없음OEM 모델 설명
The Vision 320 RIE provides etch capability for R&D, prototyping, and low volume production. This parallel-plate capacitance based systems is found in applications that include fundamental material studies, surface modification, semiconductor device fabrication, and failure analysis involving delayering. This system, found in both academic and industrial environments, is a result of their small footprint along with robust construction that focuses on ease of use and low maintenance. The Vision systems satisfy the high reliability requirements for critical applications such as delayering where production is dependent on constant input from the Failure Analysis department. Being outside of the fabrication process, means that the system must have turnkey operation for non-etch process oriented engineers.문서
문서 없음