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STS PRO ICP

설명

ICP Etcher Complete

환경 설정

Was used to process Gallium Nitride and diamond Configured for chlorinated plasmas (Cl2 and BCL3 MFC fitted) with also Ar, O2 and N2.

OEM 모델 설명

미제공

문서

문서 없음

STS

PRO ICP

verified-listing-icon

검증됨

카테고리

Dry / Plasma Etch

마지막 검증일: 30일 이상 전

주요 품목 세부 정보

조건:

Used

작동 상태:

알 수 없음

제품 ID:

145586

웨이퍼 사이즈:

알 수 없음

빈티지:

2007

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

유사 등재물

STS PRO ICP

STS

PRO ICP

Dry / Plasma Etch

빈티지: 2007조건: 중고

마지막 검증일30일 이상 전

STS PRO ICP

STS

PRO ICP

Dry / Plasma Etch

빈티지: 0조건: 중고

마지막 검증일60일 이상 전

STS PRO ICP

STS

PRO ICP

Dry / Plasma Etch

빈티지: 0조건: 개조됨

마지막 검증일60일 이상 전

STS

PRO ICP

verified-listing-icon

검증됨

카테고리

Dry / Plasma Etch

마지막 검증일: 30일 이상 전

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주요 품목 세부 정보

조건:

Used

작동 상태:

알 수 없음

제품 ID:

145586

웨이퍼 사이즈:

알 수 없음

빈티지:

2007

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

설명

ICP Etcher Complete

환경 설정

Was used to process Gallium Nitride and diamond Configured for chlorinated plasmas (Cl2 and BCL3 MFC fitted) with also Ar, O2 and N2.

OEM 모델 설명

미제공

문서

문서 없음

유사 등재물

STS PRO ICP

STS

PRO ICP

Dry / Plasma Etch빈티지: 2007조건: 중고마지막 검증일:30일 이상 전

STS PRO ICP

STS

PRO ICP

Dry / Plasma Etch빈티지: 0조건: 중고마지막 검증일:60일 이상 전

STS PRO ICP

STS

PRO ICP

Dry / Plasma Etch빈티지: 0조건: 개조됨마지막 검증일:60일 이상 전