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TEL / TOKYO ELECTRON TELIUS SP 305 SCCM
    설명
    Dielectric Etch
    환경 설정
    <p>Tool is operating in clean room.</p><p> </p><p>[Chamber A]</p><p>Chamber type:DRM</p><p>Gas config. (sccm)=FCS full scale</p><p> 2line(advanced radical distribution control)</p><p> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</p><p> CF4(336)/CHF3(163)/CH2F2(144)/CH3F(163)</p><p> N2(300)/CO(500)/C4F6(50.3)</p><p> O2(18.7)/N2(30)/CH2F2(14.4)</p><p>RF 13.56MHz, max 5000W</p><p>Temp Top +30~+80℃</p><p>     Wall +40~+80℃</p><p>     ESC -10~+60℃</p><p> </p><p>[Chamber B]</p><p>Chamber type:DRM</p><p>Gas config. (sccm)=FCS full scale</p><p> 2line(advanced radical distribution control)</p><p> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</p><p> CF4(336)/CHF3(163)/CH2F2(144)/CH3F(163)</p><p> N2(300)/CO(500)/C4F6(50.3)</p><p> O2(18.7)/N2(30)/CH2F2(14.4)</p><p>RF 13.56MHz, max 5000W</p><p>Temp Top +30~+80℃</p><p>     Wall +40~+80℃</p><p>     ESC -10~+60℃</p><p> </p><p>Pictures will be collected.</p><p>Missing or damaged parts: Not reported.</p>
    OEM 모델 설명
    Telius-SP is a high-performance etching system designed for large diameter (300 mm) requirements. It is part of the Telius platform and offers improved productivity through increased throughput, a reduced footprint, and higher energy efficiency. The system can be fitted with various chamber applications, including DRM and SCCM chambers, to support a wide range of process areas. It can support up to 4 chambers and boasts a high throughput, compact design, and low cost of ownership (CoO). Additionally, the system is designed for ease of maintenance. Overall, Telius-SP is a versatile and cost-effective solution for large diameter etching needs.
    문서

    문서 없음

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    verified-listing-icon

    검증됨

    카테고리
    Dry / Plasma Etch

    마지막 검증일: 5일 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    21133


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma Etch
    빈티지: 2008조건: 중고
    마지막 검증일60일 이상 전

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    verified-listing-icon
    검증됨
    카테고리
    Dry / Plasma Etch
    마지막 검증일: 5일 전
    listing-photo-SOFY4og6853aMkuBiXOSJZiH1iwFnKw_T2Q-MI1xJcg-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    21133


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Dielectric Etch
    환경 설정
    <p>Tool is operating in clean room.</p><p> </p><p>[Chamber A]</p><p>Chamber type:DRM</p><p>Gas config. (sccm)=FCS full scale</p><p> 2line(advanced radical distribution control)</p><p> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</p><p> CF4(336)/CHF3(163)/CH2F2(144)/CH3F(163)</p><p> N2(300)/CO(500)/C4F6(50.3)</p><p> O2(18.7)/N2(30)/CH2F2(14.4)</p><p>RF 13.56MHz, max 5000W</p><p>Temp Top +30~+80℃</p><p>     Wall +40~+80℃</p><p>     ESC -10~+60℃</p><p> </p><p>[Chamber B]</p><p>Chamber type:DRM</p><p>Gas config. (sccm)=FCS full scale</p><p> 2line(advanced radical distribution control)</p><p> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</p><p> CF4(336)/CHF3(163)/CH2F2(144)/CH3F(163)</p><p> N2(300)/CO(500)/C4F6(50.3)</p><p> O2(18.7)/N2(30)/CH2F2(14.4)</p><p>RF 13.56MHz, max 5000W</p><p>Temp Top +30~+80℃</p><p>     Wall +40~+80℃</p><p>     ESC -10~+60℃</p><p> </p><p>Pictures will be collected.</p><p>Missing or damaged parts: Not reported.</p>
    OEM 모델 설명
    Telius-SP is a high-performance etching system designed for large diameter (300 mm) requirements. It is part of the Telius platform and offers improved productivity through increased throughput, a reduced footprint, and higher energy efficiency. The system can be fitted with various chamber applications, including DRM and SCCM chambers, to support a wide range of process areas. It can support up to 4 chambers and boasts a high throughput, compact design, and low cost of ownership (CoO). Additionally, the system is designed for ease of maintenance. Overall, Telius-SP is a versatile and cost-effective solution for large diameter etching needs.
    문서

    문서 없음

    유사 등재물
    모두 보기
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma Etch빈티지: 2008조건: 중고마지막 검증일:60일 이상 전
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma Etch빈티지: 0조건: 중고마지막 검증일:5일 전
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma Etch빈티지: 2007조건: 중고마지막 검증일:5일 전