설명
Dielectric Etch환경 설정
<p>Tool is operating in clean room.</p><p> </p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;">[Chamber A]</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Chamber type:DRM</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Gas config. (sccm)=FCS full scale</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> 2line(advanced radical distribution control)</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> CF4(336)/CHF3(163)/CH2F2(144)</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> CH3F(163)/N2(300)</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> CHF3(25.1)/O2(18.7)/N2(30)/CH2F2(14.4)</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> RF 13.56MHz, max 5000W</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Temp Top +30~+80</span><span style="font-size: 10pt;">℃</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Wall +40~+80</span><span style="font-size: 10pt;">℃</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> ESC -10~+60</span><span style="font-size: 10pt;">℃</span></p><p> </p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;">[Chamber B]</span></p><p><span style="font-family: Verdana, sans-serif;"> Chamber type:DRM</span></p><p><span style="font-family: Verdana, sans-serif;"> Gas config. (sccm)=FCS full scale</span></p><p><span style="font-family: Verdana, sans-serif;"> 2line(advanced radical distribution control)</span></p><p><span style="font-family: Verdana, sans-serif;"> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</span></p><p><span style="font-family: Verdana, sans-serif;"> CF4(336)/CHF3(163)/CH2F2(144)</span></p><p><span style="font-family: Verdana, sans-serif;"> CH3F(163)/N2(300)</span></p><p><span style="font-family: Verdana, sans-serif;"> CHF3(25.1)/O2(18.7)/N2(30)/CH2F2(14.4)</span></p><p><span style="font-family: Verdana, sans-serif;"> RF 13.56MHz, max 5000W</span></p><p><span style="font-family: Verdana, sans-serif;"> Temp Top +30~+80</span><span style="font-size: 10pt;">℃</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Wall +40~+80</span><span style="font-size: 10pt;">℃</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> ESC -10~+60</span><span style="font-size: 10pt;">℃</span></p><p> </p><p>Pictures will be collected.</p><p>Missing or damaged parts: Not reported.</p><p> </p>OEM 모델 설명
Telius-SP is a high-performance etching system designed for large diameter (300 mm) requirements. It is part of the Telius platform and offers improved productivity through increased throughput, a reduced footprint, and higher energy efficiency. The system can be fitted with various chamber applications, including DRM and SCCM chambers, to support a wide range of process areas. It can support up to 4 chambers and boasts a high throughput, compact design, and low cost of ownership (CoO). Additionally, the system is designed for ease of maintenance. Overall, Telius-SP is a versatile and cost-effective solution for large diameter etching needs.문서
문서 없음
TEL / TOKYO ELECTRON
TELIUS SP 305 SCCM
검증됨
카테고리
Dry / Plasma Etch
마지막 검증일: 24일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
20225
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
TELIUS SP 305 SCCM
카테고리
Dry / Plasma Etch
마지막 검증일: 24일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
20225
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Dielectric Etch환경 설정
<p>Tool is operating in clean room.</p><p> </p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;">[Chamber A]</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Chamber type:DRM</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Gas config. (sccm)=FCS full scale</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> 2line(advanced radical distribution control)</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> CF4(336)/CHF3(163)/CH2F2(144)</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> CH3F(163)/N2(300)</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> CHF3(25.1)/O2(18.7)/N2(30)/CH2F2(14.4)</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> RF 13.56MHz, max 5000W</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Temp Top +30~+80</span><span style="font-size: 10pt;">℃</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Wall +40~+80</span><span style="font-size: 10pt;">℃</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> ESC -10~+60</span><span style="font-size: 10pt;">℃</span></p><p> </p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;">[Chamber B]</span></p><p><span style="font-family: Verdana, sans-serif;"> Chamber type:DRM</span></p><p><span style="font-family: Verdana, sans-serif;"> Gas config. (sccm)=FCS full scale</span></p><p><span style="font-family: Verdana, sans-serif;"> 2line(advanced radical distribution control)</span></p><p><span style="font-family: Verdana, sans-serif;"> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</span></p><p><span style="font-family: Verdana, sans-serif;"> CF4(336)/CHF3(163)/CH2F2(144)</span></p><p><span style="font-family: Verdana, sans-serif;"> CH3F(163)/N2(300)</span></p><p><span style="font-family: Verdana, sans-serif;"> CHF3(25.1)/O2(18.7)/N2(30)/CH2F2(14.4)</span></p><p><span style="font-family: Verdana, sans-serif;"> RF 13.56MHz, max 5000W</span></p><p><span style="font-family: Verdana, sans-serif;"> Temp Top +30~+80</span><span style="font-size: 10pt;">℃</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> Wall +40~+80</span><span style="font-size: 10pt;">℃</span></p><p><span style="font-family: Verdana, sans-serif; font-size: 10pt;"> ESC -10~+60</span><span style="font-size: 10pt;">℃</span></p><p> </p><p>Pictures will be collected.</p><p>Missing or damaged parts: Not reported.</p><p> </p>OEM 모델 설명
Telius-SP is a high-performance etching system designed for large diameter (300 mm) requirements. It is part of the Telius platform and offers improved productivity through increased throughput, a reduced footprint, and higher energy efficiency. The system can be fitted with various chamber applications, including DRM and SCCM chambers, to support a wide range of process areas. It can support up to 4 chambers and boasts a high throughput, compact design, and low cost of ownership (CoO). Additionally, the system is designed for ease of maintenance. Overall, Telius-SP is a versatile and cost-effective solution for large diameter etching needs.문서
문서 없음