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TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
  • TEL / TOKYO ELECTRON UNITY IIE 855 PP
설명
설명 없음
환경 설정
SIO-ETC
OEM 모델 설명
The UNITY® IIe 85 is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, including IIe, M, and Me, which were designed to achieve higher productivity and reliability for specific applications. The UNITY® IIe 85 delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM chambers, and is known for its high throughput, compact design, and lower CoO. Additionally, it offers ease of maintenance and a Flow Control System (Me). The UNITY® IIe is available in 84, 85 and 88 models.
문서

문서 없음

카테고리
Dry / Plasma Etch

마지막 검증일: 16일 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

127357


웨이퍼 사이즈:

8"/200mm


빈티지:

1997


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

TEL / TOKYO ELECTRON

UNITY IIE 855 PP

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검증됨
카테고리
Dry / Plasma Etch
마지막 검증일: 16일 전
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주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

127357


웨이퍼 사이즈:

8"/200mm


빈티지:

1997


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
SIO-ETC
OEM 모델 설명
The UNITY® IIe 85 is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, including IIe, M, and Me, which were designed to achieve higher productivity and reliability for specific applications. The UNITY® IIe 85 delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM chambers, and is known for its high throughput, compact design, and lower CoO. Additionally, it offers ease of maintenance and a Flow Control System (Me). The UNITY® IIe is available in 84, 85 and 88 models.
문서

문서 없음