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TEL / TOKYO ELECTRON UNITY IIE
  • TEL / TOKYO ELECTRON UNITY IIE
  • TEL / TOKYO ELECTRON UNITY IIE
  • TEL / TOKYO ELECTRON UNITY IIE
설명
Dry Etcher
환경 설정
환경 설정 없음
OEM 모델 설명
The UNITY® IIe is a platform designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY®, which also includes the M and Me platforms, each designed to achieve higher productivity and reliability for specific applications. The UNITY® IIe delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM chambers, and is available in 84, 85 and 88 models. The UNITY® IIe boasts high throughput, a compact design, lower CoO, and ease of maintenance.
문서

문서 없음

카테고리
Dry / Plasma Etch

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

105867


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

TEL / TOKYO ELECTRON

UNITY IIE

verified-listing-icon
검증됨
카테고리
Dry / Plasma Etch
마지막 검증일: 60일 이상 전
listing-photo-fd2905f872ae4fb0b1dbb68d56ff3425-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

105867


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Dry Etcher
환경 설정
환경 설정 없음
OEM 모델 설명
The UNITY® IIe is a platform designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY®, which also includes the M and Me platforms, each designed to achieve higher productivity and reliability for specific applications. The UNITY® IIe delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM chambers, and is available in 84, 85 and 88 models. The UNITY® IIe boasts high throughput, a compact design, lower CoO, and ease of maintenance.
문서

문서 없음