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LAM RESEARCH / NOVELLUS SABRE
    설명
    ELECTROPLATER, CU
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    SABRE has been proven to provide void-free copper fill of sub-0.15 micron trench features (at 9 or 10:1 aspect ratios) and 0.25 micron vias (at 5:1 aspect ratios). SABRE employs a proprietary electrofilling cell that eliminates the backside wafer contamination of copper, and features a unique plating cell design that ensures reproducibility of the copper fill, with a film uniformity of 3 sigma, [5% with a wafer. SABRE requires only two types of process modules to complete the electrofill process, for electrofilling (3 stations total) and the other for spin/rinse/dry (another 3 stations). The resulting simplicity of this design is key to the system's high reliability and manufacturing availability.
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    LAM RESEARCH / NOVELLUS

    SABRE

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    검증됨

    카테고리
    Electro Plating

    마지막 검증일: 30일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

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    제품 ID:

    101678


    웨이퍼 사이즈:

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    빈티지:

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    유사 등재물
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    LAM RESEARCH / NOVELLUS SABRE

    LAM RESEARCH / NOVELLUS

    SABRE

    Electro Plating
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    LAM RESEARCH / NOVELLUS

    SABRE

    verified-listing-icon
    검증됨
    카테고리
    Electro Plating
    마지막 검증일: 30일 이상 전
    listing-photo-15ea09e9c9b0414bbff114b8806ebcd6-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    101678


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    ELECTROPLATER, CU
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    SABRE has been proven to provide void-free copper fill of sub-0.15 micron trench features (at 9 or 10:1 aspect ratios) and 0.25 micron vias (at 5:1 aspect ratios). SABRE employs a proprietary electrofilling cell that eliminates the backside wafer contamination of copper, and features a unique plating cell design that ensures reproducibility of the copper fill, with a film uniformity of 3 sigma, [5% with a wafer. SABRE requires only two types of process modules to complete the electrofill process, for electrofilling (3 stations total) and the other for spin/rinse/dry (another 3 stations). The resulting simplicity of this design is key to the system's high reliability and manufacturing availability.
    문서

    문서 없음

    유사 등재물
    모두 보기
    LAM RESEARCH / NOVELLUS SABRE

    LAM RESEARCH / NOVELLUS

    SABRE

    Electro Plating빈티지: 0조건: 중고마지막 검증일: 60일 이상 전
    LAM RESEARCH / NOVELLUS SABRE

    LAM RESEARCH / NOVELLUS

    SABRE

    Electro Plating빈티지: 0조건: 중고마지막 검증일: 8일 전
    LAM RESEARCH / NOVELLUS SABRE

    LAM RESEARCH / NOVELLUS

    SABRE

    Electro Plating빈티지: 0조건: 중고마지막 검증일: 30일 이상 전