설명
설명 없음환경 설정
AS-IS AMAT Centura HTF 3ch Epi system, ATM ‐ 200mm ‐ Centura 5200 HTF Toxic Epi mainframe - 480V/60Hz/600A - Wide Body ENP loadlocks ‐ Wafer mapping ‐ HP robot ‐ Remote Centerfinding ‐ Epi chamber RP Position: A, B, C * R3.4 rotation assy * Variable Speed Blower ‐ Single slot non-contact cooldown chamber, position F ‐ Legacy Gas Panel (USED) * H2 Slit - 20 SLM * H2 Main - 100 SLM * HCL - 1 SLM * DCS - 1 SLM (Not Used, was RP tool) * MixDop - 300 SCCM * TCS - 30 SLM * Direct Dop - 500 SCCMOEM 모델 설명
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.문서
문서 없음
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
67521
웨이퍼 사이즈:
알 수 없음
빈티지:
1997
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
CENTURA 5200 HTF
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
67521
웨이퍼 사이즈:
알 수 없음
빈티지:
1997
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
AS-IS AMAT Centura HTF 3ch Epi system, ATM ‐ 200mm ‐ Centura 5200 HTF Toxic Epi mainframe - 480V/60Hz/600A - Wide Body ENP loadlocks ‐ Wafer mapping ‐ HP robot ‐ Remote Centerfinding ‐ Epi chamber RP Position: A, B, C * R3.4 rotation assy * Variable Speed Blower ‐ Single slot non-contact cooldown chamber, position F ‐ Legacy Gas Panel (USED) * H2 Slit - 20 SLM * H2 Main - 100 SLM * HCL - 1 SLM * DCS - 1 SLM (Not Used, was RP tool) * MixDop - 300 SCCM * TCS - 30 SLM * Direct Dop - 500 SCCMOEM 모델 설명
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.문서
문서 없음