설명
설명 없음환경 설정
Centura 5200 TCPP - Single Chamber Radiance Plus Included: Electro Polished Nickel Frame & Modules 2ea ENP Centura Loadlocks for 200mm Wafers Wafer Transfer Chamber with HP Robot High Temperature Quartz End Effector On the Fly Wafer Centering 2ea TanOx Chambers - Positions C & D 2ea ENP Fast Cooldown Chambers V452 Main Control Board Gas Panel with 2ea Gas Pallets Interconnect Cables AC Distribution Rack – 160A Through the Wall Installation KitOEM 모델 설명
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP문서
문서 없음
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 9일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
73468
웨이퍼 사이즈:
알 수 없음
빈티지:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 9일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
73468
웨이퍼 사이즈:
알 수 없음
빈티지:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Centura 5200 TCPP - Single Chamber Radiance Plus Included: Electro Polished Nickel Frame & Modules 2ea ENP Centura Loadlocks for 200mm Wafers Wafer Transfer Chamber with HP Robot High Temperature Quartz End Effector On the Fly Wafer Centering 2ea TanOx Chambers - Positions C & D 2ea ENP Fast Cooldown Chambers V452 Main Control Board Gas Panel with 2ea Gas Pallets Interconnect Cables AC Distribution Rack – 160A Through the Wall Installation KitOEM 모델 설명
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP문서
문서 없음