설명
설명 없음환경 설정
PolyGen Chamber Single wf Boron doped poly deposition @ reduced pressure (gas: B2H6, SiH4; pressure 275 Torr; temperature: 730 C) Chamber: POLYgen 200 TPCC The chamber was UP and running before decommissioning, installed on AMAT CENTURA mainframe in position “D”OEM 모델 설명
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP문서
문서 없음
APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
검증됨
카테고리
Epitaxial deposition (EPI)
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
27602
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
검증됨
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
27602
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
PolyGen Chamber Single wf Boron doped poly deposition @ reduced pressure (gas: B2H6, SiH4; pressure 275 Torr; temperature: 730 C) Chamber: POLYgen 200 TPCC The chamber was UP and running before decommissioning, installed on AMAT CENTURA mainframe in position “D”OEM 모델 설명
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP문서
문서 없음