설명
26M06환경 설정
환경 설정 없음OEM 모델 설명
Introducing the PE 2061 S Reactor: A field-proven epitaxial wafer production solution, specially designed for severe applications like PowerMos, Discrete, IGBT, and special devices up to 250 microns per 200 Ohm x cm. With its compact barrel design, atmospheric and reduced pressure process capabilities, and one-pass gas flow low frequency inductive heating, it's the top choice for leading semiconductor manufacturers worldwide. Experience efficient wafer handling in a class 10 environment, accommodating 4'', 5'', 6'', and 8'' wafers. Optimize your Clean Room space with its through the wall mounting configuration.문서
문서 없음
LPE
2061S
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 6일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
150056
웨이퍼 사이즈:
6"/150mm
빈티지:
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
26M06환경 설정
환경 설정 없음OEM 모델 설명
Introducing the PE 2061 S Reactor: A field-proven epitaxial wafer production solution, specially designed for severe applications like PowerMos, Discrete, IGBT, and special devices up to 250 microns per 200 Ohm x cm. With its compact barrel design, atmospheric and reduced pressure process capabilities, and one-pass gas flow low frequency inductive heating, it's the top choice for leading semiconductor manufacturers worldwide. Experience efficient wafer handling in a class 10 environment, accommodating 4'', 5'', 6'', and 8'' wafers. Optimize your Clean Room space with its through the wall mounting configuration.문서
문서 없음