Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturing

NUFLARE

EGV-30GX

For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor

NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm
(4"" Deep Pocket )

The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.

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NuFlare EGV-30GX 6"Susceptor(Covalent Material)φ740mm

The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.

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For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor

NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm

The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.

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EGV-30GX

카테고리

개요

활성 등재물

서비스

상위 등재물

NUFLARE

EGV-30GX

NUFLARE

EGV-30GX

NUFLARE

EGV-30GX

Moov에 등재하고 즉시 완벽한 구매자를 찾으십시오.