설명
For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm (4"" Deep Pocket ) The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.환경 설정
Size: - φ740mm - φ100mm Thickness: - 14.4mm Weight: - 10Kg/EAOEM 모델 설명
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturing문서
문서 없음
NUFLARE
EGV-30GX
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 13일 전
주요 품목 세부 정보
조건:
Parts Tool
작동 상태:
알 수 없음
제품 ID:
152532
웨이퍼 사이즈:
4"/100mm
빈티지:
2015
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm (4"" Deep Pocket ) The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.환경 설정
Size: - φ740mm - φ100mm Thickness: - 14.4mm Weight: - 10Kg/EAOEM 모델 설명
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturing문서
문서 없음