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OXFORD CrystalFlex

설명

CrystalFlex HPVE Reactor furnace GaN wafer for R&D and/or Production

환경 설정

SPECS: Growth rate - Up to 200 microns/hour Growth pressure - Atmospheric operation Maximum Furnace Temp - 1200°C Carrier gas - Inert gas of N2 or Ar Reactant Gas - HCl and NH Wafer capacity Wafer size - Max Load 50mm - 12 75mm - 4 100mm - 3 150mm - 1

OEM 모델 설명

Multi-Wafer Hydride Vapor Phase Epitaxy (HVPE) Reactor

문서

문서 없음

OXFORD

CrystalFlex

verified-listing-icon

검증됨

카테고리

Epitaxial deposition (EPI)

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used

작동 상태:

알 수 없음

제품 ID:

89778

웨이퍼 사이즈:

6"/150mm

빈티지:

2009

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

유사 등재물

OXFORD CrystalFlex

OXFORD

CrystalFlex

Epitaxial deposition (EPI)

빈티지: 2009조건: 중고

마지막 검증일60일 이상 전

OXFORD

CrystalFlex

verified-listing-icon

검증됨

카테고리

Epitaxial deposition (EPI)

마지막 검증일: 60일 이상 전

listing-photo-17937d13f8fb4c8480f2e9ff26c99b82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75737/17937d13f8fb4c8480f2e9ff26c99b82/e4cdcbdcdd844081b0ae484a013abd87_c3d719b9e139492abd909eb4033db3f1_mw.jpeg

listing-photo-17937d13f8fb4c8480f2e9ff26c99b82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75737/17937d13f8fb4c8480f2e9ff26c99b82/ce4071fc8a614a36a3ce1589ca8bb43b_d9e7ccfb224540afa27ba59cf5fc3e77_mw.jpeg

listing-photo-17937d13f8fb4c8480f2e9ff26c99b82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75737/17937d13f8fb4c8480f2e9ff26c99b82/6add78974e6d40d2ab3ed5daef9f96e2_6d1fe68b959045d0a805a48f03bf830a_mw.jpeg

주요 품목 세부 정보

조건:

Used

작동 상태:

알 수 없음

제품 ID:

89778

웨이퍼 사이즈:

6"/150mm

빈티지:

2009

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

설명

CrystalFlex HPVE Reactor furnace GaN wafer for R&D and/or Production

환경 설정

SPECS: Growth rate - Up to 200 microns/hour Growth pressure - Atmospheric operation Maximum Furnace Temp - 1200°C Carrier gas - Inert gas of N2 or Ar Reactant Gas - HCl and NH Wafer capacity Wafer size - Max Load 50mm - 12 75mm - 4 100mm - 3 150mm - 1

OEM 모델 설명

Multi-Wafer Hydride Vapor Phase Epitaxy (HVPE) Reactor

문서

문서 없음

유사 등재물

OXFORD CrystalFlex

OXFORD

CrystalFlex

Epitaxial deposition (EPI)빈티지: 2009조건: 중고마지막 검증일:60일 이상 전