VEECO / APPLIED EPI / VARIAN

GEN II

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Details Attached 

MBE System 
- CTI-10 cryopump and a 400 l/s ion pump for ultra-pure epitaxial growth potential



Veeco MBE Gen II.pdf

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MBE MOD System 

Three Inch wafer, 8 sources.

Indium-free 10 sample holders with different profiles.

Substrate heater up to 1000 C.

Substrate manipulator: power supply, temperature controller, and servo motor control unit.

Clean chamber and can be used for any materials.

All sources are on 4.5” flanges.

Effusion cells can be configured as required.

Two valved crackers (as required).

RF plasma source for either nitrogen or oxygen.

Growth chamber pumps: 400 l/m ion pump and 10” cryo pump.

Prep chamber pumps: 220 l/m ion pump.

Load lock pumps: Sorption, mechanical, and turbo pumps.

Three ion gauges and controllers.

RHEED and QMS systems.

Pyrometer.

New software and PC.

Bake out panels.

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GEN II

카테고리

개요

활성 등재물

서비스

상위 등재물

VEECO / APPLIED EPI / VARIAN

GEN II

VEECO / APPLIED EPI / VARIAN

GEN II

VEECO / APPLIED EPI / VARIAN

GEN II

VEECO / APPLIED EPI / VARIAN

GEN II

Moov에 등재하고 즉시 완벽한 구매자를 찾으십시오.

VEECO / APPLIED EPI / VARIAN

GEN II