설명
MBE MOD System Three Inch wafer, 8 sources. Indium-free 10 sample holders with different profiles. Substrate heater up to 1000 C. Substrate manipulator: power supply, temperature controller, and servo motor control unit. Clean chamber and can be used for any materials. All sources are on 4.5” flanges. Effusion cells can be configured as required. Two valved crackers (as required). RF plasma source for either nitrogen or oxygen. Growth chamber pumps: 400 l/m ion pump and 10” cryo pump. Prep chamber pumps: 220 l/m ion pump. Load lock pumps: Sorption, mechanical, and turbo pumps. Three ion gauges and controllers. RHEED and QMS systems. Pyrometer. New software and PC. Bake out panels.환경 설정
환경 설정 없음OEM 모델 설명
미제공문서
문서 없음
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 9일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
144927
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
VEECO / APPLIED EPI / VARIAN
GEN II
카테고리
Epitaxial deposition (EPI)
마지막 검증일: 9일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
144927
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
MBE MOD System Three Inch wafer, 8 sources. Indium-free 10 sample holders with different profiles. Substrate heater up to 1000 C. Substrate manipulator: power supply, temperature controller, and servo motor control unit. Clean chamber and can be used for any materials. All sources are on 4.5” flanges. Effusion cells can be configured as required. Two valved crackers (as required). RF plasma source for either nitrogen or oxygen. Growth chamber pumps: 400 l/m ion pump and 10” cryo pump. Prep chamber pumps: 220 l/m ion pump. Load lock pumps: Sorption, mechanical, and turbo pumps. Three ion gauges and controllers. RHEED and QMS systems. Pyrometer. New software and PC. Bake out panels.환경 설정
환경 설정 없음OEM 모델 설명
미제공문서
문서 없음