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설명
ASHER환경 설정
ASHEROEM 모델 설명
The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.문서
문서 없음
LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2100
검증됨
카테고리
Etch/Asher
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
48869
웨이퍼 사이즈:
8"/200mm
빈티지:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2100
카테고리
Etch/Asher
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
48869
웨이퍼 사이즈:
8"/200mm
빈티지:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
ASHER환경 설정
ASHEROEM 모델 설명
The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.문서
문서 없음