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ASM A400 with one standard Power Poly reactor and one Dope Power Poly reactor.환경 설정
ASMi A400 LPCVD Dope PP & LPCVD std PP reactor Heater type: 5 zones Gas panel layout: SiH4 - N2 - Dopand Brooks MFC's Process pressure: 80 ÷ 120 mTorr Process temperature: 620 - 680 °C Genmark MK4 Robot Paddle temprature control PowerPoly specific flanges temp controlled at 80 °C Gas/smoke detection of SiH4OEM 모델 설명
The ASM AD400 is a diffusion and oxidation furnaces system used in semiconductor manufacturing. It is designed for processing 8-inch wafers with dual tubes or 6-inch wafers with dual boats. The system's body is anodized to resist corrosion, ensuring durability and reliability during wafer processing.문서
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ASM
A400
카테고리
Furnaces / Diffusion
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
65295
웨이퍼 사이즈:
알 수 없음
빈티지:
1998
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설명
ASM A400 with one standard Power Poly reactor and one Dope Power Poly reactor.환경 설정
ASMi A400 LPCVD Dope PP & LPCVD std PP reactor Heater type: 5 zones Gas panel layout: SiH4 - N2 - Dopand Brooks MFC's Process pressure: 80 ÷ 120 mTorr Process temperature: 620 - 680 °C Genmark MK4 Robot Paddle temprature control PowerPoly specific flanges temp controlled at 80 °C Gas/smoke detection of SiH4OEM 모델 설명
The ASM AD400 is a diffusion and oxidation furnaces system used in semiconductor manufacturing. It is designed for processing 8-inch wafers with dual tubes or 6-inch wafers with dual boats. The system's body is anodized to resist corrosion, ensuring durability and reliability during wafer processing.문서
문서 없음