설명
dry oxidation at temperatures between 700 -1150°C. Batches of up to 50 wafers (4 to 6”) low pressure chemical vapor deposition (LPCVD) tool used for silicon nitride deposition at temperature between 700-850°C with batches of up to 50 wafers (4 to 6”)환경 설정
MRL Cyclone 630 Configured: 4 to 6" Tube 1: LPCVD Silicon Nitride, used for silicon nitride deposition at temperatures between 700-850°C Tube 2: Dry Oxidation at temperatures between 700 -1150°C Tube 3: N/A Tube 4: N/AOEM 모델 설명
미제공문서
문서 없음
MRL
Cyclone 630
검증됨
카테고리
Furnaces / Diffusion
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
111178
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MRL
Cyclone 630
카테고리
Furnaces / Diffusion
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
111178
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
dry oxidation at temperatures between 700 -1150°C. Batches of up to 50 wafers (4 to 6”) low pressure chemical vapor deposition (LPCVD) tool used for silicon nitride deposition at temperature between 700-850°C with batches of up to 50 wafers (4 to 6”)환경 설정
MRL Cyclone 630 Configured: 4 to 6" Tube 1: LPCVD Silicon Nitride, used for silicon nitride deposition at temperatures between 700-850°C Tube 2: Dry Oxidation at temperatures between 700 -1150°C Tube 3: N/A Tube 4: N/AOEM 모델 설명
미제공문서
문서 없음