We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The Quantum X Plus is a groundbreaking single-wafer, high-current implanter that has set new standards in 65nm production. It offers superior low-energy, high-dose performance, enabling device scaling and delivering exceptional capabilities for Logic and Memory applications. The implanter's fixed beam technology, combined with a precision mechanical scanning system, provides unmatched features such as defect engineering for ultra-shallow junction formation below 45nm and precise angle control for advanced memory structures. When paired with the Applied Vantage RadiancePlus RTP, the Quantum X Plus forms a powerful combination, incorporating cutting-edge co-implantation and defect engineering technology to meet both current and future high-current implantation requirements. Key features of the Quantum X Plus include the highest productivity for ultra-shallow junction formation across a wide energy range, two-dimensional parallel scanning with StepScan for precise angle control and iso-centric scanning for high tilt applications, advanced motion control for optimal crystal defect management, and predictive and managed uniformity for consistent implant results.문서
문서 없음
카테고리
High Current
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
32096
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
QUANTUM X PLUS
카테고리
High Current
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
32096
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
The Quantum X Plus is a groundbreaking single-wafer, high-current implanter that has set new standards in 65nm production. It offers superior low-energy, high-dose performance, enabling device scaling and delivering exceptional capabilities for Logic and Memory applications. The implanter's fixed beam technology, combined with a precision mechanical scanning system, provides unmatched features such as defect engineering for ultra-shallow junction formation below 45nm and precise angle control for advanced memory structures. When paired with the Applied Vantage RadiancePlus RTP, the Quantum X Plus forms a powerful combination, incorporating cutting-edge co-implantation and defect engineering technology to meet both current and future high-current implantation requirements. Key features of the Quantum X Plus include the highest productivity for ultra-shallow junction formation across a wide energy range, two-dimensional parallel scanning with StepScan for precise angle control and iso-centric scanning for high tilt applications, advanced motion control for optimal crystal defect management, and predictive and managed uniformity for consistent implant results.문서
문서 없음