설명
Axcelis HC GSD 200mm Software Version: VM (Virtual Machine) 8.0 CIM: SECS Process: HC Implant (B11, BF2, As and P) No Pumps, Chillers & Abatement 1 Blade Server환경 설정
Handler System: ARM (Non HPES) Factory Interface: None Handler System Holder: (Non HPES) Options System: Silicon Disk Options System: SEF EGUN Main System: Axcelis GSD 200 E2 Handling System: In air HandlerOEM 모델 설명
The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.문서
문서 없음
AXCELIS
GSD 200E2
카테고리
High Current
마지막 검증일: 6일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Installed / Down
제품 ID:
146005
웨이퍼 사이즈:
8"/200mm
빈티지:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Axcelis HC GSD 200mm Software Version: VM (Virtual Machine) 8.0 CIM: SECS Process: HC Implant (B11, BF2, As and P) No Pumps, Chillers & Abatement 1 Blade Server환경 설정
Handler System: ARM (Non HPES) Factory Interface: None Handler System Holder: (Non HPES) Options System: Silicon Disk Options System: SEF EGUN Main System: Axcelis GSD 200 E2 Handling System: In air HandlerOEM 모델 설명
The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.문서
문서 없음