설명
설명 없음환경 설정
IMPLANTER_HIGH CURRENTOEM 모델 설명
The NV-GSD III-80 is a high-current ion implanter that has become a de facto standard in the industry. It is versatile, supporting a medium-current range and various applications, thanks to its post-deflection acceleration system. It caters to different wafer sizes, supporting 5, 6, and 8-inch wafers. The implanter offers a wide range of implantation energy from 2 to 180 keV, facilitated by its unique acceleration mechanism. It also features a reliable batch transfer system for smooth operations and highly effective throughput for increased productivity. The NV-GSD III-80 ensures precise results with its reliable high-dose control accuracy and maintains the integrity of the process with its high beam quality that results in low metal contamination and low cross-contamination.문서
문서 없음
카테고리
High Current
마지막 검증일: 11일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
140463
웨이퍼 사이즈:
6"/150mm
빈티지:
2003
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AXCELIS
NV GSD III 180
카테고리
High Current
마지막 검증일: 11일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
140463
웨이퍼 사이즈:
6"/150mm
빈티지:
2003
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
IMPLANTER_HIGH CURRENTOEM 모델 설명
The NV-GSD III-80 is a high-current ion implanter that has become a de facto standard in the industry. It is versatile, supporting a medium-current range and various applications, thanks to its post-deflection acceleration system. It caters to different wafer sizes, supporting 5, 6, and 8-inch wafers. The implanter offers a wide range of implantation energy from 2 to 180 keV, facilitated by its unique acceleration mechanism. It also features a reliable batch transfer system for smooth operations and highly effective throughput for increased productivity. The NV-GSD III-80 ensures precise results with its reliable high-dose control accuracy and maintains the integrity of the process with its high beam quality that results in low metal contamination and low cross-contamination.문서
문서 없음