설명
TUBING,CENTER,RH,ROTATING MASS SLIT P/N: E12004040/E11084590 TUBING,CENTER,LH,ROTATING MASS SLIT P/N: E11084591/E12004041환경 설정
환경 설정 없음OEM 모델 설명
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.문서
문서 없음
APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
검증됨
카테고리
High Current
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Parts Tool
작동 상태:
알 수 없음
제품 ID:
54324
웨이퍼 사이즈:
6"/150mm, 8"/200mm
빈티지:
2022
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
카테고리
High Current
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Parts Tool
작동 상태:
알 수 없음
제품 ID:
54324
웨이퍼 사이즈:
6"/150mm, 8"/200mm
빈티지:
2022
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
TUBING,CENTER,RH,ROTATING MASS SLIT P/N: E12004040/E11084590 TUBING,CENTER,LH,ROTATING MASS SLIT P/N: E11084591/E12004041환경 설정
환경 설정 없음OEM 모델 설명
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.문서
문서 없음