설명
설명 없음환경 설정
Compressor: CTI X 4EA Chamber Cryo Pump: CT-8 Source Dry Pump: Edward Beamline Dry Pump: Varian Diffusion L/L Rough Pump: EdwardOEM 모델 설명
The Varian 160XP is a high current ion implanter used in semiconductor manufacturing. It was manufactured by Varian in 1991 and operates on a voltage of 208 volts with a phase of 3+1. It is part of the XP series of ion implant systems by Varian.문서
문서 없음
APPLIED MATERIALS (AMAT) / VARIAN
160XP
검증됨
카테고리
High Current
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
24736
웨이퍼 사이즈:
알 수 없음
빈티지:
1991
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT) / VARIAN
160XP
카테고리
High Current
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
24736
웨이퍼 사이즈:
알 수 없음
빈티지:
1991
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Compressor: CTI X 4EA Chamber Cryo Pump: CT-8 Source Dry Pump: Edward Beamline Dry Pump: Varian Diffusion L/L Rough Pump: EdwardOEM 모델 설명
The Varian 160XP is a high current ion implanter used in semiconductor manufacturing. It was manufactured by Varian in 1991 and operates on a voltage of 208 volts with a phase of 3+1. It is part of the XP series of ion implant systems by Varian.문서
문서 없음