We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기
설명
설명 없음환경 설정
Compressor: CTI X 4EA Chamber Cryo Pump: CT-8 Source Dry Pump: Edward Beamline Dry Pump: Varian Diffusion L/L Rough Pump: EdwardOEM 모델 설명
The Varian 160XP is a high current ion implanter used in semiconductor manufacturing. It was manufactured by Varian in 1991 and operates on a voltage of 208 volts with a phase of 3+1. It is part of the XP series of ion implant systems by Varian.문서
문서 없음
카테고리
High Current
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
24736
웨이퍼 사이즈:
알 수 없음
빈티지:
1991
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
APPLIED MATERIALS (AMAT) / VARIAN
160XP
카테고리
High Current
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
24736
웨이퍼 사이즈:
알 수 없음
빈티지:
1991
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Compressor: CTI X 4EA Chamber Cryo Pump: CT-8 Source Dry Pump: Edward Beamline Dry Pump: Varian Diffusion L/L Rough Pump: EdwardOEM 모델 설명
The Varian 160XP is a high current ion implanter used in semiconductor manufacturing. It was manufactured by Varian in 1991 and operates on a voltage of 208 volts with a phase of 3+1. It is part of the XP series of ion implant systems by Varian.문서
문서 없음