설명
VCR Group IBS TM200S ion beam sputtering system is useful for SEM and TEM sample preparation. The IBS/TM200 Ion beam sputter-coating device is equipped with a 200 l/s turbo-molecular pump, an ion-beam gun, a quartz crystal thickness monitor, a four-position target carrier, and a liquid nitrogen cold trap.환경 설정
System specifications: Electrical: Interlocked to prevent high voltage shock 110 V AC, 50/ 60 Hz, 15 A 220 V AC, 50/ 60 Hz, 10 A (Optional) Mechanical: Weight: < 500 lbs Size: Approximate overall dimensions 50” H x 24” W x 32” D (chamber lid open) 40” H x 24” W x 32” D (chamber lid closed) Utilities: Argon Gas Flow: 5-10 psi, 1.5 sccm, 99.999 % pure Nitrogen Gas Flow: Turbomolecular Pump bleed Water Flow: 30 GPH, clean waterOEM 모델 설명
The IBS TM200S is an ion beam sputtering system manufactured by VCR Group. It is designed to deposit ultra-fine grain conductive films of metals or carbon onto sample surfaces, making it particularly useful for preparing samples for scanning electron microscopy (SEM) and transmission electron microscopy (TEM).문서
문서 없음
IBS
TM200S
카테고리
Ion Beam / IBD
마지막 검증일: 10일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
17433
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
VCR Group IBS TM200S ion beam sputtering system is useful for SEM and TEM sample preparation. The IBS/TM200 Ion beam sputter-coating device is equipped with a 200 l/s turbo-molecular pump, an ion-beam gun, a quartz crystal thickness monitor, a four-position target carrier, and a liquid nitrogen cold trap.환경 설정
System specifications: Electrical: Interlocked to prevent high voltage shock 110 V AC, 50/ 60 Hz, 15 A 220 V AC, 50/ 60 Hz, 10 A (Optional) Mechanical: Weight: < 500 lbs Size: Approximate overall dimensions 50” H x 24” W x 32” D (chamber lid open) 40” H x 24” W x 32” D (chamber lid closed) Utilities: Argon Gas Flow: 5-10 psi, 1.5 sccm, 99.999 % pure Nitrogen Gas Flow: Turbomolecular Pump bleed Water Flow: 30 GPH, clean waterOEM 모델 설명
The IBS TM200S is an ion beam sputtering system manufactured by VCR Group. It is designed to deposit ultra-fine grain conductive films of metals or carbon onto sample surfaces, making it particularly useful for preparing samples for scanning electron microscopy (SEM) and transmission electron microscopy (TEM).문서
문서 없음