설명

Electron beam lithography system SEIKO SEIKI STP-301 Turbomolecular pump KASHIYAMA NeoDry 30-E PIC-050A-IP Control unit 20L/60L Ion pump 30L/S912－7135S Pump data KEITHLEY 6485 Picoammeter IWATSU ST-3708 Laser displacement meter M-UPS-030AD2S Uninterruptible Power Supply (UPS) DAN-TAKUMA TECHNOLOGIES Thermal controller APCO AIP-38A Ionpump power supply

환경 설정

환경 설정 없음

OEM 모델 설명

-Small spot size same as 100kV tool but more stable -High Beam position resolution-0.0012nm minimum address size with FSM -Proper Stigmation & Focusing adjustment with Clear SEM -Stable beam position for a long period of time -Uniformed Beam current in the field -Stable Beam current for a long time -Noise reduction by specially designed of P/S & Permalloy box. -Initial correction of field distortion has to be done properly for good stitching -Deflection has to be electrostatic deflection for good stitching -Unique way to use laser interferometer prevent measurement error for good stitching -Self thermal control minimizes the measurement error for good stitching Many writing functions - Vector (X-Y), - Vector (X-Theta), - Raster, - Spot, - Axial symmetrical Pattern writing, - Field Size Modulation, - Spot scan, - 3D pattern writing -Proximity effect correction -Multi user environment – saving parameters for each different users -User friendly – Windows Xp based software and DXF & GDSII conversion -Flexible customization – Different Palette Holder