설명
Primarily used for writing lithography masks with pre-spun photoresist. Recently replaced the laser interferometer encoder and temperature controller for the environmental chamber Manuals are included for the tool, conversion software, laser encoder, and temperature controller.환경 설정
405nm laser with a 4mm write head Working software both to convert and write on two computers (GDSII was the go-to format, has other file format options, including Grayscale Can handle large substrates up to 9x9" Maximum write field up to 200mmOEM 모델 설명
미제공문서
문서 없음
카테고리
Lithography
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
145810
웨이퍼 사이즈:
알 수 없음
빈티지:
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HEIDELBERG INSTRUMENTS
DWL 66FS
카테고리
Lithography
마지막 검증일: 3일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
145810
웨이퍼 사이즈:
알 수 없음
빈티지:
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Primarily used for writing lithography masks with pre-spun photoresist. Recently replaced the laser interferometer encoder and temperature controller for the environmental chamber Manuals are included for the tool, conversion software, laser encoder, and temperature controller.환경 설정
405nm laser with a 4mm write head Working software both to convert and write on two computers (GDSII was the go-to format, has other file format options, including Grayscale Can handle large substrates up to 9x9" Maximum write field up to 200mmOEM 모델 설명
미제공문서
문서 없음