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HITACHI HL-7000M
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    OEM 모델 설명
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
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    HITACHI

    HL-7000M

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    검증됨

    카테고리
    Lithography

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    45596


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography
    빈티지: 2002조건: 중고
    마지막 검증일29일 전

    HITACHI

    HL-7000M

    verified-listing-icon
    검증됨
    카테고리
    Lithography
    마지막 검증일: 60일 이상 전
    listing-photo-6874e5c1164e48efa3cdfb265f2b3eb0-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    45596


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    문서

    문서 없음

    유사 등재물
    모두 보기
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography빈티지: 2002조건: 중고마지막 검증일:29일 전
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography빈티지: 0조건: 중고마지막 검증일:60일 이상 전