설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
Introducing the JBX-6300FS, a cutting-edge electron beam lithography system. It effortlessly writes patterns down to 8nm (actual result: 5nm) using an electron optical system with a 2.1nm-diameter electron beam at 100kV. Achieving high field-stitching and overlay accuracy of 9nm or less, it ensures exceptional cost performance. JEOL's unique automatic correction function allows high-precision pattern writing. Addressing various needs, from cutting-edge device R&D to nanotechnology and communication-device production, JBX-6300FS sets a new standard in electron beam lithography.문서
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JEOL
JBX-6300FS
검증됨
카테고리
Lithography
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
102292
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
JEOL
JBX-6300FS
카테고리
Lithography
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
102292
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
환경 설정 없음OEM 모델 설명
Introducing the JBX-6300FS, a cutting-edge electron beam lithography system. It effortlessly writes patterns down to 8nm (actual result: 5nm) using an electron optical system with a 2.1nm-diameter electron beam at 100kV. Achieving high field-stitching and overlay accuracy of 9nm or less, it ensures exceptional cost performance. JEOL's unique automatic correction function allows high-precision pattern writing. Addressing various needs, from cutting-edge device R&D to nanotechnology and communication-device production, JBX-6300FS sets a new standard in electron beam lithography.문서
문서 없음