설명
-E-beam lithography system w/ SEM -Column was replaced 5 years ago -Has a Scanning Electron Microscope to facilitate imaging and navigation of the sample -Had a service contract until 2 years ago, has been idle for a couple years -Hardware and key components are in good shape -The computer was upgraded환경 설정
SEM inspection and sample navigation * Image resolution: 2.0 nm @ 20 kV 4.0 nm @ 1 kVOEM 모델 설명
The RAITH150 is a multipurpose tool that can perform direct e-beam exposure and wafer scale process development at suboptical resolution. It includes integrated linewidth and metrology functions that optimize process reproducibility. The SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.문서
문서 없음
카테고리
Lithography
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131301
웨이퍼 사이즈:
알 수 없음
빈티지:
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
RAITH
150 E BEAM
카테고리
Lithography
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
131301
웨이퍼 사이즈:
알 수 없음
빈티지:
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
-E-beam lithography system w/ SEM -Column was replaced 5 years ago -Has a Scanning Electron Microscope to facilitate imaging and navigation of the sample -Had a service contract until 2 years ago, has been idle for a couple years -Hardware and key components are in good shape -The computer was upgraded환경 설정
SEM inspection and sample navigation * Image resolution: 2.0 nm @ 20 kV 4.0 nm @ 1 kVOEM 모델 설명
The RAITH150 is a multipurpose tool that can perform direct e-beam exposure and wafer scale process development at suboptical resolution. It includes integrated linewidth and metrology functions that optimize process reproducibility. The SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.문서
문서 없음