We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기
설명
설명 없음환경 설정
-Low kV Exposure and Imaging with Inlens SE Detector with BSE Detector Option -Accelerating Voltage up to 30kV -20 MHz Digital Pattern Generator -Stitching and Overlay Accuracy about 35nmOEM 모델 설명
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.문서
문서 없음
RAITH
150 TWO
카테고리
Lithography
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Installed / Idle
제품 ID:
114027
웨이퍼 사이즈:
6"/150mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
-Low kV Exposure and Imaging with Inlens SE Detector with BSE Detector Option -Accelerating Voltage up to 30kV -20 MHz Digital Pattern Generator -Stitching and Overlay Accuracy about 35nmOEM 모델 설명
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.문서
문서 없음