설명
High Resolution FIB-SEM, with Lithography capability -Excellent beam spot and low beam tails -FIB nano-fabrication beyond Gallium -Sub-10 nm FIB nano-fabrication -NanoFabrication with ion species beyond Gallium -Rapid, versatile manual operation -Advanced lithographic automated operation -Direct Patterning Ion milling -Exposure of photoresist, maskless ion implanting and hard masking. -Ion beam induced deposition, and gas-assisted etching -Cross-sectioning and sample preparation -Circuit editting and modification -Laser Interferometer stage allows field stitching and continuous write -Cartesian Nanomanipulators allow in-situ probing and Nanoprofiling -It has automated focus control -It is fitted with various optical cameras환경 설정
환경 설정 없음OEM 모델 설명
미제공문서
문서 없음
카테고리
Lithography
마지막 검증일: 4일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Deinstalled
제품 ID:
148405
웨이퍼 사이즈:
알 수 없음
빈티지:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
RAITH
ionLINE Plus
카테고리
Lithography
마지막 검증일: 4일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Deinstalled
제품 ID:
148405
웨이퍼 사이즈:
알 수 없음
빈티지:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
High Resolution FIB-SEM, with Lithography capability -Excellent beam spot and low beam tails -FIB nano-fabrication beyond Gallium -Sub-10 nm FIB nano-fabrication -NanoFabrication with ion species beyond Gallium -Rapid, versatile manual operation -Advanced lithographic automated operation -Direct Patterning Ion milling -Exposure of photoresist, maskless ion implanting and hard masking. -Ion beam induced deposition, and gas-assisted etching -Cross-sectioning and sample preparation -Circuit editting and modification -Laser Interferometer stage allows field stitching and continuous write -Cartesian Nanomanipulators allow in-situ probing and Nanoprofiling -It has automated focus control -It is fitted with various optical cameras환경 설정
환경 설정 없음OEM 모델 설명
미제공문서
문서 없음