Veeco Instruments Inc. a global leader of advanced thin film etch and deposition process equipment, acquired Ultratech, Inc. a leading supplier of lithography, laser-processing and inspection systems used to manufacture semiconductor devices and LEDs.


Extends capabilities to much smaller submicron patterns used for pole trimming.
0.8mm

VEECO / ULTRATECH

1800

The Ultratech 1600 DSA, also known as the NanoTech 160, is a wafer stepper system that can align wafers on both the front and back sides. It has non-contact lithography capabilities and can place multiple lithography layers on a single reticle. It also has off-axis MVS with focus and illumination controls, high wafer plane irradiance, and can be easily integrated with existing processes. Its compact system footprint makes it an ideal choice for high-volume chip production and prototyping.

1600 DSA

TITAN I

The Ultratech 1700, also known as the Ultratech Model 1700 MVS Machine Vision System, is one of Ultratech’s most sophisticated tools for air bearing surface patterning applications. It incorporates an advanced machine vision system and customized software specifically designed for rowbar level processing, allowing it to recognize and automatically align to preexisting features without the need for special targets. The Model 1700MVS is the world’s most widely used thin film head (TFH) lithography tool for high-volume manufacturing, thanks to its design simplicity, reliability, ease of operation and maintenance, low initial investment cost, and low operating costs. 

1700

1900

The AP300L targeted cost sensitive customers that do not need all of the advanced capabilities associated with our flagship product offering, such as the low end outsourced semiconductor assembly and test ("OSAT") market segment.

AP300L

TITAN III

2000GH

The Ultratech AP300W is a type of stepper lithography system that belongs to the AP200/300 series of systems. These systems are built on Veeco’s Unity Platform™, which is customizable. The AP300W and other systems in the series are known for their excellent overlay, resolution, and side wall profile performance. They are also highly automated and cost-effective. The AP300W is particularly well-suited for applications such as copper pillar, fan-out, through-silicon via (TSV), and silicon interposer. The platform also includes many features that are specific to certain applications, which help to enable next-generation packaging techniques. Some of these features include enhanced handling of warped wafers, dual side alignment, and optical focus.

AP300W

1700 ABS are used to expose the Air Bearing Surface (ABS) pattern.

1700 ABS

The Ultratech AP200 is part of the AP200/300 family of lithography systems that delivers superior performance in terms of overlay, resolution, and side wall profile. These systems are highly automated and cost-effective, making them well-suited for applications such as copper pillar, fan-out, through-silicon via (TSV), and silicon interposer. The platform also has numerous application-specific features that enable next-generation packaging techniques, including enhanced warped wafer handling, dual side alignment, and optical focus.

AP200

The Sapphire 100 is also based on the 1000 Series platform, with additional features developed specifically for HBLED lithography applications. HBLED manufacturing requires special substrate handling capabilities for the small diameter sapphire and silicon carbide substrates used to manufacture the LED devices for display backlighting and general lighting applications. For HBLED applications, we believe our Sapphire 100 stepper offers depth of focus, productivity and yield improvement advantages over competitive product offerings.


SAPPHIRE 100

The ULTRATECH AP300 is a stepper and scanner system that can produce wafers of 200-300mm in size. It is built on Veeco’s customizable Unity Platform™, which delivers superior overlay, resolution, and side wall profile performance, enabling highly automated and cost-effective manufacturing. The AP300 is particularly well-suited for copper pillar, fan-out, through-silicon via (TSV), and silicon interposer applications. It also has numerous application-specific product features to enable next-generation packaging techniques, such as enhanced warped wafer handling, dual side alignment, and optical focus.

AP300

The Sapphire 100, was developed for the manufacturing of high-brightness light-emitting diodes (HBLEDs). The Sapphire 100 system is intended to assist Ultratech’s customers in meeting the increasing demand for illumination products that utilize HBLED technology. Additionally, the Sapphire 100 system incorporates Ultratech’s patented Machine Vision System (MVS), which provides enhanced alignment flexibility and significant benefits over traditional alignment methods. The system is suitable for use in a variety of applications, including HBLEDs, semiconductor fabrication, nanotechnology, and advanced packaging (through the AP series).

SAPPHIRE 100E

1600

The Ultratech TITAN II is a type of wafer stepper that belongs to the Ultratech series of lithography systems. It is capable of handling wafers that range in size from 4 inches to 8 inches, and it has a reticle size of 5 x 5 inches. The system has a projection ratio of 1:1, a lens resolution of 2 micrometers, and a field size of 44 millimeters by 22 millimeters. Additionally, the TITAN II includes a reticle library that has 12 slots and a bar code reader. It also has a stage with a monolithic structure and linear motor drive. The system is equipped with active air isolation to control vibrations and has global alignment accuracy of 120 nanometers in just 3 seconds. The imaging and lens system can achieve feature sizes as small as 2.0 micrometers, with lens distortion of 120 nanometers and colinearity of 80 nanometers. The maximum image area is 55 millimeters by 18 millimeters, and the exposure spectrum is broadband, ranging from 390 nanometers to 450 nanometers. The wafer plane intensity is greater than 1200 milliwatts per square centimeter, with uniformity of 2.0%.

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

VEECO / ULTRATECH

개요

활성 등재물

총 제품 수

서비스

상위 VEECO / ULTRATECH Lithography

1900

1700

AP300W

AP300L

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모든 VEECO / ULTRATECH Lithography