설명

1.1 The MPA-600 lithography equipment is second-hand equipment. After debugging, it should meet the requirements of automatic exposure of 6-inch silicon wafers. 1.2 The lighting source is a high-pressure spherical mercury lamp with a spectrum of G/H/I mixed lines. 1.3 The exposure method is 1:1 projection of the pattern on the reticle onto the wafer and exposure in a scanning manner. 1.4 Operation mode: manual and semi-automatic exposure modes, easy to operate and maintain. 1.5 High efficiency and good stability. 1.6 There is sufficient supply of spare parts

환경 설정

Mask Aligner

OEM 모델 설명

The Canon MPA-600FA is a high-throughput mirror projection mask aligner delivers stable performance ideal for VLSI chip production, boasting a 1.5um resolution and +/- 6um depth-of-focus across the entire field for 4”, 5”, and 6” wafers. With field-proven auto alignment via laser scanning, target placement in scribe lines, and seamless compatibility for mix-and-match with steppers, it's a top-tier solution for precision alignments.