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QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
  • QUINTEL Q 4000
설명
Status - Installed, power off QUINTEL Q4000 is a soft-etching, contact-based mask aligner. It is designed to enable precise, high-yield lithography processes used for the production of semiconductor devices, MEMS, and other microscale components. It is also used for the production of other nanostructure and nanoscale devices. The machinery is composed of a scanning stage, a mechanical assembly, an optical imaging equipment, and ancillaries. The scanning stage consists of two orthogonal axes of motion, an X-axis and a Y-axis. This allows the mask to be precisely positioned in the optical field-of-view. The mechanical assembly is designed to ensure optimal mechanical tolerances for dimensional accuracy, flatness, and leveling of the masks. This is essential for achieving the highest possible lithographic throughput.
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검증됨

카테고리
Mask/Bond Aligners

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

Installed / Down


제품 ID:

103539


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

QUINTEL

Q 4000

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검증됨
카테고리
Mask/Bond Aligners
마지막 검증일: 60일 이상 전
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주요 품목 세부 정보

조건:

Used


작동 상태:

Installed / Down


제품 ID:

103539


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Status - Installed, power off QUINTEL Q4000 is a soft-etching, contact-based mask aligner. It is designed to enable precise, high-yield lithography processes used for the production of semiconductor devices, MEMS, and other microscale components. It is also used for the production of other nanostructure and nanoscale devices. The machinery is composed of a scanning stage, a mechanical assembly, an optical imaging equipment, and ancillaries. The scanning stage consists of two orthogonal axes of motion, an X-axis and a Y-axis. This allows the mask to be precisely positioned in the optical field-of-view. The mechanical assembly is designed to ensure optimal mechanical tolerances for dimensional accuracy, flatness, and leveling of the masks. This is essential for achieving the highest possible lithographic throughput.
환경 설정
환경 설정 없음
OEM 모델 설명
미제공
문서

문서 없음