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AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
  • AXCELIS GSD HE
설명
설명 없음
환경 설정
환경 설정 없음
OEM 모델 설명
The GSD/HE is a high-energy implant device that is designed to maximize productivity and flexibility in a wide range of implant applications, including 200mm high energy implantation for logic and memory chips. With an energy range from 10keV to over 3MeV, it can perform all retrograde wells and channel implants in a chain. The device features exceptional beam purity, thanks to its patented linear acceleration technology, and is built on a production-proven GSD wafer-handling architecture. It is also easy to access and maintain, which helps to increase productivity and reduce the cost of ownership. Additionally, the GSD/HE can be used as a backup for medium current implantation, further increasing ROI.
문서
verified-listing-icon

검증됨

카테고리
Medium Current

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Refurbished


작동 상태:

알 수 없음


제품 ID:

113304


웨이퍼 사이즈:

6"/150mm


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AXCELIS

GSD HE

verified-listing-icon
검증됨
카테고리
Medium Current
마지막 검증일: 60일 이상 전
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주요 품목 세부 정보

조건:

Refurbished


작동 상태:

알 수 없음


제품 ID:

113304


웨이퍼 사이즈:

6"/150mm


빈티지:

알 수 없음


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
환경 설정 없음
OEM 모델 설명
The GSD/HE is a high-energy implant device that is designed to maximize productivity and flexibility in a wide range of implant applications, including 200mm high energy implantation for logic and memory chips. With an energy range from 10keV to over 3MeV, it can perform all retrograde wells and channel implants in a chain. The device features exceptional beam purity, thanks to its patented linear acceleration technology, and is built on a production-proven GSD wafer-handling architecture. It is also easy to access and maintain, which helps to increase productivity and reduce the cost of ownership. Additionally, the GSD/HE can be used as a backup for medium current implantation, further increasing ROI.
문서