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SUSS MicroTec / KARL SUSS DSM200
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    With the DSM200, SUSS MicroTec has developed a new automated metrology system for all emerging front to backside alignment applications. The cassette-cassette front-to-back alignment metrology system is the ideal tool for verifying alignment accuracy on wafers from 2 inch to 200mm. Incorporating state-of-the-art pattern recognition technology, the DSM200 offers the highest measurement accuracy of 0.2 microns at 3 sigma on a fully automated platform with minimized operator intervention. Based on the latest production platform of the SUSS MA200Compact Mask Aligner, the DSM200 provides reliable and accurate metrology for double-sided alignment and exposure applications frequently used in the manufacturing of MEMS devices, power semiconductors and optoelectronics.
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    SUSS MicroTec / KARL SUSS

    DSM200

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    Metrology
    마지막 검증일: 60일 이상 전
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    제품 ID:

    82039


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    SUSS MicroTec / KARL SUSS DSM200
    SUSS MicroTec / KARL SUSSDSM200Metrology
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    SUSS MicroTec / KARL SUSS

    DSM200

    verified-listing-icon

    검증됨

    카테고리

    Metrology
    마지막 검증일: 60일 이상 전
    listing-photo-f1b93a49b2ae4c10a4fd55257239aadc-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    82039


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Overlay measurement
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    With the DSM200, SUSS MicroTec has developed a new automated metrology system for all emerging front to backside alignment applications. The cassette-cassette front-to-back alignment metrology system is the ideal tool for verifying alignment accuracy on wafers from 2 inch to 200mm. Incorporating state-of-the-art pattern recognition technology, the DSM200 offers the highest measurement accuracy of 0.2 microns at 3 sigma on a fully automated platform with minimized operator intervention. Based on the latest production platform of the SUSS MA200Compact Mask Aligner, the DSM200 provides reliable and accurate metrology for double-sided alignment and exposure applications frequently used in the manufacturing of MEMS devices, power semiconductors and optoelectronics.
    문서
    유사 등재물
    모두 보기
    SUSS MicroTec / KARL SUSS DSM200
    SUSS MicroTec / KARL SUSS
    DSM200
    Metrology빈티지: 0조건: 중고마지막 검증일: 60일 이상 전