메인 콘텐츠로 건너뛰기
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기

Moov logo

Moov Icon
SUSS MicroTec / KARL SUSS DSM200
  • SUSS MicroTec / KARL SUSS DSM200
  • SUSS MicroTec / KARL SUSS DSM200
  • SUSS MicroTec / KARL SUSS DSM200
설명
Overlay measurement
환경 설정
환경 설정 없음
OEM 모델 설명
With the DSM200, SUSS MicroTec has developed a new automated metrology system for all emerging front to backside alignment applications. The cassette-cassette front-to-back alignment metrology system is the ideal tool for verifying alignment accuracy on wafers from 2 inch to 200mm. Incorporating state-of-the-art pattern recognition technology, the DSM200 offers the highest measurement accuracy of 0.2 microns at 3 sigma on a fully automated platform with minimized operator intervention. Based on the latest production platform of the SUSS MA200Compact Mask Aligner, the DSM200 provides reliable and accurate metrology for double-sided alignment and exposure applications frequently used in the manufacturing of MEMS devices, power semiconductors and optoelectronics.
문서
카테고리
Metrology

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

82039


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

SUSS MicroTec / KARL SUSS

DSM200

verified-listing-icon
검증됨
카테고리
Metrology
마지막 검증일: 60일 이상 전
listing-photo-f1b93a49b2ae4c10a4fd55257239aadc-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

82039


웨이퍼 사이즈:

알 수 없음


빈티지:

알 수 없음


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Overlay measurement
환경 설정
환경 설정 없음
OEM 모델 설명
With the DSM200, SUSS MicroTec has developed a new automated metrology system for all emerging front to backside alignment applications. The cassette-cassette front-to-back alignment metrology system is the ideal tool for verifying alignment accuracy on wafers from 2 inch to 200mm. Incorporating state-of-the-art pattern recognition technology, the DSM200 offers the highest measurement accuracy of 0.2 microns at 3 sigma on a fully automated platform with minimized operator intervention. Based on the latest production platform of the SUSS MA200Compact Mask Aligner, the DSM200 provides reliable and accurate metrology for double-sided alignment and exposure applications frequently used in the manufacturing of MEMS devices, power semiconductors and optoelectronics.
문서