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KLA 5200
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    환경 설정
    Lithography Equipmentin Metrology EquipmentKLA Tencor,
    OEM 모델 설명
    The KLA 5200 is an overlay metrology system that helps chipmakers improve process control and reduce time to market for advanced products with feature sizes down to .18 µm. It uses Coherence Probe Microscopy (CPM) to identify surfaces and can measure all layers, including low-contrast or grainy targets. The KLA 5200 can lower stepper cost-of-ownership by providing high-quality data to prevent lithography process errors, helping manage the overlay budget and maximizing lithography output.
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    KLA

    5200

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    검증됨

    카테고리

    Metrology
    마지막 검증일: 60일 이상 전
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    97175


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    2000

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    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    KLA 5200
    KLA5200Metrology
    빈티지: 2000조건: 중고
    마지막 검증일60일 이상 전

    KLA

    5200

    verified-listing-icon

    검증됨

    카테고리

    Metrology
    마지막 검증일: 60일 이상 전
    listing-photo-1b7c85824a7d4dffaa94c7a4d2c7279b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    97175


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    2000


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    Lithography Equipmentin Metrology EquipmentKLA Tencor,
    OEM 모델 설명
    The KLA 5200 is an overlay metrology system that helps chipmakers improve process control and reduce time to market for advanced products with feature sizes down to .18 µm. It uses Coherence Probe Microscopy (CPM) to identify surfaces and can measure all layers, including low-contrast or grainy targets. The KLA 5200 can lower stepper cost-of-ownership by providing high-quality data to prevent lithography process errors, helping manage the overlay budget and maximizing lithography output.
    문서

    문서 없음

    유사 등재물
    모두 보기
    KLA 5200
    KLA
    5200
    Metrology빈티지: 2000조건: 중고마지막 검증일: 60일 이상 전
    KLA 5200
    KLA
    5200
    Metrology빈티지: 0조건: 중고마지막 검증일: 60일 이상 전