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KLA ARCHER 300
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    The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.
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    KLA

    ARCHER 300

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    카테고리

    Metrology
    마지막 검증일: 60일 이상 전
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    제품 ID:

    39133


    웨이퍼 사이즈:

    12"/300mm


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    KLA ARCHER 300
    KLAARCHER 300Metrology
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    KLA

    ARCHER 300

    verified-listing-icon

    검증됨

    카테고리

    Metrology
    마지막 검증일: 60일 이상 전
    listing-photo-b6c6ec78e6b74e36bec1cae9544131d3-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    39133


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.
    문서

    문서 없음

    유사 등재물
    모두 보기
    KLA ARCHER 300
    KLA
    ARCHER 300
    Metrology빈티지: 0조건: 중고마지막 검증일: 60일 이상 전
    KLA ARCHER 300
    KLA
    ARCHER 300
    Metrology빈티지: 0조건: 중고마지막 검증일: 60일 이상 전
    KLA ARCHER 300
    KLA
    ARCHER 300
    Metrology빈티지: 0조건: 중고마지막 검증일: 60일 이상 전