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설명
Film Thickness Measurement System환경 설정
환경 설정 없음OEM 모델 설명
The SpectraLASER 200 XL is a product by Rudolph Technologies that provides repeatable t, n, and k measurements for semiconductor process control. It uses intense laser light for small-spot measurements on product wafers in various applications, including CMP, CVD, diffusion, lithography, and etch. The stable laser light output and long laser lifetimes (20-30,000 hours) ensure system-to-system matching and measurement stability. The product also features a deep UV reflectometer and simultaneous multiple angle of incidence data acquisition for optimum sensitivity. These capabilities allow the SpectraLASER 200 XL to characterize new semiconductor manufacturing processes and maintain control over them long term.문서
문서 없음
카테고리
Metrology
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
104576
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ONTO / RUDOLPH / AUGUST
SpectraLASER 200 XL
카테고리
Metrology
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
104576
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Film Thickness Measurement System환경 설정
환경 설정 없음OEM 모델 설명
The SpectraLASER 200 XL is a product by Rudolph Technologies that provides repeatable t, n, and k measurements for semiconductor process control. It uses intense laser light for small-spot measurements on product wafers in various applications, including CMP, CVD, diffusion, lithography, and etch. The stable laser light output and long laser lifetimes (20-30,000 hours) ensure system-to-system matching and measurement stability. The product also features a deep UV reflectometer and simultaneous multiple angle of incidence data acquisition for optimum sensitivity. These capabilities allow the SpectraLASER 200 XL to characterize new semiconductor manufacturing processes and maintain control over them long term.문서
문서 없음