설명
Aixtron CRIUS CCS Aixtron CRIUS CCS System - CRIUS Si-III/V tool for laser-on-silicon - (CCS) 300mm CRIUS cluster system, the system Including two silicon-based and III/V-based MOCVD modules, the application is particularly suitable for growing III/V compound semiconductors on commercially available silicon wafers. Diode lasers are made from a dilute nitride Ga (NAsP) material system deposited on silicon. Ga(NAsP) is particularly suitable for realizing next-generation 850nm diode lasers for data communications. In addition to laser-on-silicon integration, such devices will play a very important role in the future, especially when considering CMOS on-silicon. When used in applications such as III/V.환경 설정
환경 설정 없음OEM 모델 설명
The AIXTRON CRIUS is a metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE, a leading provider of deposition equipment used in the semiconductor industry. The CRIUS series is designed for the epitaxial growth of compound semiconductor materials, offering advanced features and capabilities.문서
문서 없음
AIXTRON
CRIUS
검증됨
카테고리
MOCVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Deinstalled
제품 ID:
104132
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
AIXTRON
CRIUS
카테고리
MOCVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Deinstalled
제품 ID:
104132
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Aixtron CRIUS CCS Aixtron CRIUS CCS System - CRIUS Si-III/V tool for laser-on-silicon - (CCS) 300mm CRIUS cluster system, the system Including two silicon-based and III/V-based MOCVD modules, the application is particularly suitable for growing III/V compound semiconductors on commercially available silicon wafers. Diode lasers are made from a dilute nitride Ga (NAsP) material system deposited on silicon. Ga(NAsP) is particularly suitable for realizing next-generation 850nm diode lasers for data communications. In addition to laser-on-silicon integration, such devices will play a very important role in the future, especially when considering CMOS on-silicon. When used in applications such as III/V.환경 설정
환경 설정 없음OEM 모델 설명
The AIXTRON CRIUS is a metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE, a leading provider of deposition equipment used in the semiconductor industry. The CRIUS series is designed for the epitaxial growth of compound semiconductor materials, offering advanced features and capabilities.문서
문서 없음