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설명
설명 없음환경 설정
AIXTRON CCS for GaN Configuration: Wafer Size: 6 x 2" 2 x 4" 1 x 6" Above throughput is possible with current tool configuration. No modifications required. MO Sources: S1 Cp2Mg – 1 S2 Cp2Mg – 2 (spare) S3 TMAl S4 TMGa – 2 S5 TMGa – 1 S6 TMIn – 1 S7 TMIn – 2 (spare) Gases: 100ppm SiH4 NH3 N2 H2 PH3 (for use if converted to III-V) AsH3 (for use if converted to III-V) Installed Parts: showerhead heater Pd cell H2 purifier Epison flow sensors on TMGa and TMIn KSA MiniMOS inisitu high resolution stress monitoring instrument Alcatel glovebox pump Ebara 825 process pump Alcatel regen pump Other Equipment: LLydel chiller for 0°C to 80°C temp control for showerhead Cleansorb SC dry bed abatement systemOEM 모델 설명
Close Coupled Showerhead 6x2 inch Deposition system for compound semiconductors문서
문서 없음
AIXTRON
6x2 CCS
카테고리
MOCVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Deinstalled / Uncrated
제품 ID:
67167
웨이퍼 사이즈:
알 수 없음
빈티지:
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
AIXTRON CCS for GaN Configuration: Wafer Size: 6 x 2" 2 x 4" 1 x 6" Above throughput is possible with current tool configuration. No modifications required. MO Sources: S1 Cp2Mg – 1 S2 Cp2Mg – 2 (spare) S3 TMAl S4 TMGa – 2 S5 TMGa – 1 S6 TMIn – 1 S7 TMIn – 2 (spare) Gases: 100ppm SiH4 NH3 N2 H2 PH3 (for use if converted to III-V) AsH3 (for use if converted to III-V) Installed Parts: showerhead heater Pd cell H2 purifier Epison flow sensors on TMGa and TMIn KSA MiniMOS inisitu high resolution stress monitoring instrument Alcatel glovebox pump Ebara 825 process pump Alcatel regen pump Other Equipment: LLydel chiller for 0°C to 80°C temp control for showerhead Cleansorb SC dry bed abatement systemOEM 모델 설명
Close Coupled Showerhead 6x2 inch Deposition system for compound semiconductors문서
문서 없음