We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기
설명
설명 없음환경 설정
AIX GS WW C Planetary Reactor for deposition on 8 x150 mm wafers Computer control system MES interface SECS II/GEM for MOVPE systems (incl. router) GAS HANDLING SYSTEM Standard metalorganic channel [MOG1] with 2 LOTO hand valves as customer interface; bubbler placed outside GMS cabinet (1xTCS) Combined standard and dilution metalorganic channel [MOG1/G3-D] (2xTMAI) Standard gas channel with pusher, for low flow [MOG2] (1xNN, 1xHCI) Triple-Cascading standard gas channel with pusher [MOG2-T] (3xC3H8) Combined standard and dilution/dopant gas channel [MOG2/G4-D] (2xN2) Additional pusher for MO-G4 (1xN2) Carrier gas channel (Dummy line) for balancing gas flow switching (1xR/V Center, 1xR/V Bottom) MO-differential run/vent pressure balancing (1xMO, 1xR/V center) MO-Vac High Pressure Purge Epison 5 (1xTCS) PROCESS CONTROL EpiCurve TT® AR 3W Automatic Feed Forward incl. Autosat GAS PURIFICATION Spare provision for standard purifier HCI Spare provision for standard purifier (C3H8) Single Port Hygrometer incl. valve and housing (H2/N2)) Ar limiter AUTOMATION Automatic Cassette to Cassette wafer handler for high temperature operation (600C)OEM 모델 설명
AIX G5 WW C Planetary Reactor for 150 mm SiC문서
문서 없음
카테고리
MOCVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
New
작동 상태:
알 수 없음
제품 ID:
117152
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AIXTRON
AIX G5 WW C
카테고리
MOCVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
New
작동 상태:
알 수 없음
제품 ID:
117152
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
AIX GS WW C Planetary Reactor for deposition on 8 x150 mm wafers Computer control system MES interface SECS II/GEM for MOVPE systems (incl. router) GAS HANDLING SYSTEM Standard metalorganic channel [MOG1] with 2 LOTO hand valves as customer interface; bubbler placed outside GMS cabinet (1xTCS) Combined standard and dilution metalorganic channel [MOG1/G3-D] (2xTMAI) Standard gas channel with pusher, for low flow [MOG2] (1xNN, 1xHCI) Triple-Cascading standard gas channel with pusher [MOG2-T] (3xC3H8) Combined standard and dilution/dopant gas channel [MOG2/G4-D] (2xN2) Additional pusher for MO-G4 (1xN2) Carrier gas channel (Dummy line) for balancing gas flow switching (1xR/V Center, 1xR/V Bottom) MO-differential run/vent pressure balancing (1xMO, 1xR/V center) MO-Vac High Pressure Purge Epison 5 (1xTCS) PROCESS CONTROL EpiCurve TT® AR 3W Automatic Feed Forward incl. Autosat GAS PURIFICATION Spare provision for standard purifier HCI Spare provision for standard purifier (C3H8) Single Port Hygrometer incl. valve and housing (H2/N2)) Ar limiter AUTOMATION Automatic Cassette to Cassette wafer handler for high temperature operation (600C)OEM 모델 설명
AIX G5 WW C Planetary Reactor for 150 mm SiC문서
문서 없음