설명
[OPM NEW & 2nd SOURCE NEW ONLY] - Technical Specifications: 1. Core Performance & Thermal Properties Operating Temperature: Recommended up to < 700°C (Optimal for AlN stability). Thermal Conductivity: High-performance 170 W/m·K for superior heat transfer. Temperature Uniformity: Excellent distribution across the entire 200mm surface. Thermal Expansion: Coefficient similar to Silicon (Si), minimizing wafer stress and slippage during thermal cycling. 2. Material Reliability Plasma Resistance: Excellent durability against erosive cleaning gases (NF3, CF4, etc.). Anti-Corrosion: High resistance to chemical attack in aggressive deposition environments. Durability: Engineered for long-lifecycle performance in high-duty cycle fabs. 3.Applications This heater assembly is specifically designed for high-precision semiconductor vacuum processes: CVD (Chemical Vapor Deposition) ALD (Atomic Layer Deposition) Diffusion Annealing환경 설정
환경 설정 없음OEM 모델 설명
Ceramic Heater Assy문서
문서 없음
카테고리
Parts
마지막 검증일: 어제
주요 품목 세부 정보
조건:
New
작동 상태:
Deinstalled
제품 ID:
145694
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
0010-03840
카테고리
Parts
마지막 검증일: 어제
주요 품목 세부 정보
조건:
New
작동 상태:
Deinstalled
제품 ID:
145694
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
[OPM NEW & 2nd SOURCE NEW ONLY] - Technical Specifications: 1. Core Performance & Thermal Properties Operating Temperature: Recommended up to < 700°C (Optimal for AlN stability). Thermal Conductivity: High-performance 170 W/m·K for superior heat transfer. Temperature Uniformity: Excellent distribution across the entire 200mm surface. Thermal Expansion: Coefficient similar to Silicon (Si), minimizing wafer stress and slippage during thermal cycling. 2. Material Reliability Plasma Resistance: Excellent durability against erosive cleaning gases (NF3, CF4, etc.). Anti-Corrosion: High resistance to chemical attack in aggressive deposition environments. Durability: Engineered for long-lifecycle performance in high-duty cycle fabs. 3.Applications This heater assembly is specifically designed for high-precision semiconductor vacuum processes: CVD (Chemical Vapor Deposition) ALD (Atomic Layer Deposition) Diffusion Annealing환경 설정
환경 설정 없음OEM 모델 설명
Ceramic Heater Assy문서
문서 없음