설명
APPLIED MATERIALS AMAT AKT 25 K GEN 6 PECVD CHAMBER ONLY환경 설정
Chambers were never commisioned and remain in “new” unused condition. Sold “AS IS” Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: ASTRON HF+, AX7636-04OEM 모델 설명
AKT-25K PECVD(1,500mm x 1,850mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers문서
문서 없음
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
25K PECVD
검증됨
카테고리
PECVD
마지막 검증일: 20일 전
주요 품목 세부 정보
조건:
Parts Tool
작동 상태:
Deinstalled
제품 ID:
113545
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
25K PECVD
카테고리
PECVD
마지막 검증일: 20일 전
주요 품목 세부 정보
조건:
Parts Tool
작동 상태:
Deinstalled
제품 ID:
113545
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
APPLIED MATERIALS AMAT AKT 25 K GEN 6 PECVD CHAMBER ONLY환경 설정
Chambers were never commisioned and remain in “new” unused condition. Sold “AS IS” Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: ASTRON HF+, AX7636-04OEM 모델 설명
AKT-25K PECVD(1,500mm x 1,850mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers문서
문서 없음